Ametek Spectro teams up with SII NanoTechnology to market inductively coupled plasma optical-emission spectrometers in Japan

Feb. 1, 2011
Spectro Analytical Instruments has formed a strategic marketing alliance with SII NanoTechnology (Chiba, Japan) to market Spectro’s inductively coupled plasma optical-emission spectrometers (ICP-OESs) in Japan.

Kleve, Germany--Spectro Analytical Instruments has formed a strategic marketing alliance with SII NanoTechnology (Chiba, Japan) to market Spectro’s inductively coupled plasma optical-emission spectrometers (ICP-OESs) in Japan.

Spectro Analytical Instruments is a unit of Ametek (Berwyn, PA), which makes electronic instruments and electromechanical devices. SII NanoTechnology will also market Spectro’s mass spectrometers (ICP-MSs) in Japan.

The ICP-OES Arcos contains 32 linear CCD detectors in an optimized Paschen-Runge diffraction-grating mount for simultaneous recording of wavelengths between 130 and 770 nm. It is used for ultra-trace analysis for environmental applications, line-rich spectra for metal applications, analysis of organic materials in petrochemistry, or similar applications.

The ICP-OES Genesis has a more ergonomic design, lighter weight, and simplified operation than the larger Spectro ARCOS. The Genesis records at wavelengths between 175 and 777 nm, enabling the simultaneous determination of more than 70 elements. It is designed to meet the requirements of industrial users. Applications include industrial wastewater analysis, wear analysis of metals, soil and sludge testing, and chemical testing.

The alliance covers all Spectro ICP-OES and ICP-MS instruments. Spectro will continue to support its existing Japanese customers through a subsidiary formed in 2008. Spectro has sold an ICP-OES system to SII NanoTechnology for use at its Tokyo facility for demonstrations and application support.

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About the Author

John Wallace | Senior Technical Editor (1998-2022)

John Wallace was with Laser Focus World for nearly 25 years, retiring in late June 2022. He obtained a bachelor's degree in mechanical engineering and physics at Rutgers University and a master's in optical engineering at the University of Rochester. Before becoming an editor, John worked as an engineer at RCA, Exxon, Eastman Kodak, and GCA Corporation.

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