ArF excimer laser from Gigaphoton for multipatterning immersion lithography
The GT63A ArF excimer laser for multipatterning immersion lithography includes Spectrum Multi-Positioning for focus drilling, which increases laser spectrum control for wider depth of focus. Additional features include the company’s Recycled Chamber Operation System, Supreme Total Gas Manager, and Smart Monitoring for real-time information management.
Gigaphoton
Oyama, Japan
[email protected]
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PRESS RELEASE
Gigaphoton Shipping the "GT63A" - The Next-Generation ArF Excimer Laser for Multi-Patterning Immersion Lithography
Introduction of the breakthrough "s" series features, extending DUV light source performance, enhancing availability and reducing operating costs
OYAMA, JAPAN - Gigaphoton, Inc., a major lithography light source manufacturer, announced that the company will begin shipping the GT63A, the next-generation ArF excimer laser for multi-patterning immersion lithography scanners in the second quarter of 2012.
The powerful GT63A options were designed in response to customers' needs to create additional value by incorporating the four "s" series features: sMPL (Spectrum Multi-Positioning LNM)*1, the first customer approved spectrum control ("focus drilling") technology achieving wider depth of focus; sGRYCOS (Sixty Gigaphoton Recycled Chamber Operation System), a unique chamber technology lowering operating costs; sTGM (Supreme Total Gas Manager), a gas management system achieving higher uptime with less process gas use; and sMONITORING (Smart Monitoring), real-time information management tracking the highest laser stability in the market. These "s" series features are compatible with existing GT60A*2, GT61A, and GT62A models, given they share a truly common platform with the GT63A.
The sMPL technology for focus drilling increases laser spectrum control width to 10 times that of conventional technology, creating a greater depth of focus. Focus drilling enables expansion of the lithography process window for contact holes, trenches and vias, not possible with conventional technology, while avoiding negative effects upon critical dimension uniformity (CDU), overlay and productivity. The sMPL technology was tested in a high-volume manufacturing environment in partnership with a leading scanner manufacturer and device manufacturer.
The enhanced sGRYCOS technology extends the effective life of a laser chamber - one of the main consumable components of an excimer laser - 1.5 times longer than any conventional chamber today. This world-class endurance significantly reduces factory operating costs. This durability results from increasing the strength of the pre-ionization electrode in a newly developed chamber and uses a robust pulse-power supply for today's and tomorrow's power requirements.
The sTGM technology implements an innovative wavelength calibration method to eliminate all previous need to routinely replace the laser chamber's gas. This new industry standard completely eliminates wasted process gases due to calibration requirements, measurably reducing facility costs and improving laser availability on an annual basis. This unique gas management technology allows for system calibration of laser wavelength "as-is" without replacement of the laser chamber's gas, a first of its kind capability.
The sMONITORING technology is an extension of existing real-time monitoring of laser performance and can be connected with the end-user's FDC (Fault Detection and Classification) system to monitor system operation. It is a final check upon highly stable laser output to the scanner and on-wafer performance.
"Our new and enhanced technologies have finally cleared the toughest hurdle, to enhance lithographic performance and throughput at a lower cost with the "s" series features introduced with the GT63A. Gigaphoton's chamber lifetime, focus drilling and gas management capabilities are now the standard for our industry. We believe that we will deliver more added value to our customers by starting shipment of the GT63A and upgrading existing GT60A series lasers. We at Gigaphoton will continue to invest and improve critical DUV technology with leading-edge technologies and support forces. We appreciate the trust and continued support of our customers," said Dr. Yuji Watanabe, president of Gigaphoton.
About Gigaphoton
Since its founding in 2000, Gigaphoton has developed and delivered user-friendly, high-performance DUV laser light sources used by major semi-conductor chipmakers in the Pan-Asian, US and European regions.
Gigaphoton's patented, innovative LPP EUV technology solutions will lead the way to cost-effective, highly productive lithography sources for high-volume production. With a global business outlook, Gigaphoton strives to be the world's number-one lithography light source provider, focusing on end-user needs in every phase of its business, from research and development to manufacturing to best-in-class reliability and world-class customer support. Visit http://www.gigaphoton.com/e/index.html.
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