ArF light source from Cymer designed for 14 nm chip manufacturing

    March 3, 2015
    The XLR 700ix argon fluoride immersion light source provides bandwidth control of 300 ± 5 fm to eliminate a source of process variation.

    The XLR 700ix argon fluoride immersion light source for advanced 14 nm chip manufacturing provides bandwidth control of 300 ± 5 fm to eliminate a source of process variation. Improved bandwidth, wavelength, and energy stability allow high scanner throughput and process stability. The source uses half the helium of previous models, with 15% less power consumption.
    Cymer
    San Diego, CA
    www.cymer.com

    More Products

    -----

    Follow us on Twitter

    Subscribe now to Laser Focus World magazine; it's free!

    Continue Reading

    Sponsored Recommendations

    March 31, 2025
    Enhance your remote sensing capabilities with Chroma's precision-engineered optical filters, designed for applications such as environmental monitoring, geospatial mapping, and...
    March 31, 2025
    Designed for compatibility with a wide range of systems, Chroma's UV filters are engineered to feature high transmission, superior out-of-band blocking, steep edge transitions...
    March 31, 2025
    Discover strategies to balance component performance and system design, reducing development time and costs while maximizing efficiency.
    March 31, 2025
    Explore the essential role of optical filters in enhancing Raman spectroscopy measurements including the various filter types and their applications in improving signal-to-noise...

    Voice your opinion!

    To join the conversation, and become an exclusive member of Laser Focus World, create an account today!