Zygo lands $9 Million CNSE/SEMATECH contract for EUV micro-exposure tool optics
MIDDLEFIELD, CT--The Optical Systems Division of Zygo (Nasdaq: ZIGO) has been awarded a contract valued in excess of $9 million with the College of Nanoscale Science and Engineering (CNSE) of the University at Albany and the SEMATECH consortium of chipmakers to develop extreme ultraviolet (EUV) lithography optics to be incorporated into the next, fifth generation Micro-Exposure Tool (MET-5) at CNSE's Albany NanoTech Complex. The MET-5 program is being managed by the SEMATECH consortium.
The MET-5 program is intended to aid researchers in extending semiconductor lithography resolution capability to less than 16 nm. This is in support of EUV resist and EUV mask developments intended to meet the international technology roadmap for semiconductors and associated decreasing linewidths. Advanced development and production is expected to take place over a 22-month period and will be carried out by Zygo's Extreme Precision Optics operation in Richmond, CA.
Chris Koliopoulos, Zygo President and CEO, stated, "Development of the next generation Micro-Exposure Tool represents an important milestone for Zygo and further solidifies Zygo's position as a key supplier of EUV components. We are also very pleased to be working closely with CNSE and SEMATECH and its members to push the boundaries of photolithography technology to new, extreme levels."
SOURCE: Zygo
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Conard Holton | Editor at Large
Conard Holton has 25 years of science and technology editing and writing experience. He was formerly a staff member and consultant for government agencies such as the New York State Energy Research and Development Authority and the International Atomic Energy Agency, and engineering companies such as Bechtel. He joined Laser Focus World in 1997 as senior editor, becoming editor in chief of WDM Solutions, which he founded in 1999. In 2003 he joined Vision Systems Design as editor in chief, while continuing as contributing editor at Laser Focus World. Conard became editor in chief of Laser Focus World in August 2011, a role in which he served through August 2018. He then served as Editor at Large for Laser Focus World and Co-Chair of the Lasers & Photonics Marketplace Seminar from August 2018 through January 2022. He received his B.A. from the University of Pennsylvania, with additional studies at the Colorado School of Mines and Medill School of Journalism at Northwestern University.