Peak-to-Valley (PV) and Root-Mean-Square (RMS) are two common parameters used to measure the difference between an ideal optic surface to the actual optic surface. Historically the PV is used more often than RMS but RMS is a much better method for measuring the feat of an optic. Neither one of them are perfect parameters to fully calculate the optics’ performance.
PV is the measurement of the height difference between the highest point and the lowest point on the surface of the optic. In an ideal world, the PV will solve the worst cases of the optics’ performance at the eyes of optics designer. This is only true if there is low order of aberration or large size features on the optics. It also assumes that the measurements are precise and optics surface is noise free.
In reality, the surface of an optic has imperfections that are within less than 1mm to aperture. The measurement is also processed with instrument having vast difference of MTF (modular transfer function) and noise level. Each manufacturer has its own proprietary “measuring method” to mask the actual measurements. It basically interpolates the standard parameters to something unknown to designers, professionals or vendors. This practice from manufacturers will be primarily based on the interpolator’s knowledge of optical performance and can quickly go out of control.
It is quite common to see cost and manufacturability to be determined purely upon the value of PV. Most will demand a 1/10 wave PV optics without specifying the testing condition and with minimum budget. This will result in an unworkable project or over priced component or reinterpreted specification by vendor. It is nearly impossible to get absolute 1/10 wave PV optics in the manufacturing process.
Plots of 1 micron PV for basic terms of aberration and its corresponding RMS are shown below. As you can see, the RMS is noticeably different for each basic term of aberration. Considering the similarity of alignment error in each system, the performance impact of each term is all relative to the ability of aligning specific error out at the final system.