The Critical Role of Custom Objectives in Semiconductor Manufacturing

Custom optical objectives are crucial for semiconductor manufacturing and inspection, enabling the precision needed for advanced technologies. High numerical aperture (NA) objectives are particularly important for achieving the resolution required for sub-5nm feature sizes. The semiconductor industry relies heavily on a complex and interconnected supply chain to deliver the cutting-edge products and systems that power modern devices. Within this ecosystem, specialized companies that focus on the design and manufacture of high-precision optical components play a crucial role.

Key Applications

• Photolithography: High NA objectives focus UV or EUV light onto wafers with nanometer precision, creating intricate circuit patterns. They require high transmission at specific wavelengths (e.g., 193nm or 13.5nm), exceptional thermal stability, and minimized aberrations.
• Metrology and Inspection: Custom objectives can enhance tools like CD-SEMs, optical profilometers, and defect inspection systems. High NA lenses improve resolution and depth of field for precise dimensional measurements and sub-nanometer defect detection.

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