UV symposium focuses on 157 nm

The Second International UV Laser Symposium, held Oct. 13-14, 1999, by Lambda Physik (Fort Lauderdale, FL), attracted 90 attendees and concentrated on applications of the 157-nm-emitting fluorine excimer laser. Attending industry experts included lithography researcher Mordechai Rothschild (Massachusetts Institute of Technology; Cambridge, MA) and Rich Harbison (Sematech; Austin, TX). About one-third of the talks were related to optical lithography, with the remainder divided between materials-processing and scientific applications, according to Mike Scaggs, director of customer support at Lambda Physik. The highlight of the symposium, says Scaggs, was that "157-nm technology has advanced so much in a year."