Jenoptik presents the infrared JenLas disk IR70 disk laser for micromaterials processing

Jenoptik, Jena, Germany, is presenting the new infrared disk laser JenLas® disk IR70 for the solid-state laser product range. Thus, the Jenoptik disk laser product family, including the JenLas® disk IR50 already known in the market, is supplemented with a powerful variant. The laser particularly fulfills the requirements of the new technologies in the photovoltaic sector such as metal wrap-through (MWT) or emitter wrap-through (EWT, up to 20,000 holes/second).

The laser is suitable for application in micro materials processing, e.g. for cutting stents, and for micro structuring. Jenoptik products are distributed in North America by RPMC Lasers, O'Fallon, Missouri.

The electrical efficiency of the solar cells is increased by applying the MWT or EWT technology. With both technologies, the contacts are installed on the rear side of the cell instead of the front side in order to enlarge the active cell surface. The previously customary contact tracks shadowing parts of the active surface are thus partly eliminated.

The pulse lengths of the lasers are adjustable independently of the repetition rate so that optimal process parameters can be set. With a pulse energy of up to 7 mJ and repetition rates of up to 100 kHz, the JenLas disk IR70 covers a broad spectrum of applications in the infrared wavelength range of 1,030 nm. Thus, the 65 W system is ideal for laser-based drilling of silicon wafers for the production of efficient solar cells with rear side contacts.