Semiconductor equipment SUSS MicroTec (Garching, Germany) and micro resist technology (MRT; Berlin, Germany), which develops and produces photoresists and advanced nanoimprint materials, will cooperate on nanoimprint lithography (NIL)—a key enabler of additive manufacturing through high-fidelity pattern transfer. This UV-curing stamping process is increasingly used in the production of future emerging application in photonics, such as diffractive optical elements in augmented-reality glasses or for face recognition, as well as for the transfer of micro- and nanoscale structures in optical sensors, laser nanopatterned sapphire substrates, or anticounterfeiting.
The requirements for nanoimprint lithography and its applications are continuously changing. Therefore, the fundamental objective of the cooperation is to understand newly emerging requirements and to solve them by implementing solutions at both process and materials level, thus addressing the high challenges set by the players in this industry.
The SUSS Imprint Excellence Center, a combined venture of SUSS MicroTec Lithography GmbH and SUSS MicroOptics SA, addresses equipment and high-volume process manufacturing expertise, which will be strengthened by MRT's chemical expertise. The collaboration will help to better serve the high demand of the industry with its ever-more challenging requirements on the replication of nanostructures.
For more information, please visit suss.com and microresist.de.