Lasers & Sources

Diode laser system offers processing temperature monitoring

Nov. 29, 2021

The DLight S diode laser system for laser wafer annealing generates a 70 μm narrow line laser beam with an aspect ratio of 160:1.

The DLight S diode laser system for laser wafer annealing generates a 70 μm narrow line laser beam with an aspect ratio of 160:1. It offers continuous energy output up to 1800 W/mm², for >95% beam uniformity and >98% output power stability. It also has processing temperature monitoring and in situ detection of output beam quality.

Focuslight Technologies

Xi’an, China

focuslight.com

GET PRICING

Continue Reading

Is your Quantum 2.0 solution stable enough?

Optical design software: From nano to system scale

Sponsored Recommendations

Brain Computer Interface (BCI) electrode manufacturing

Jan. 31, 2025

Learn how an industry-leading Brain Computer Interface Electrode (BCI) manufacturer used precision laser micromachining to produce high-density neural microelectrode arrays.

Electro-Optic Sensor and System Performance Verification with Motion Systems

Jan. 31, 2025

To learn how to use motion control equipment for electro-optic sensor testing, click here to read our whitepaper!

How nanopositioning helped achieve fusion ignition

Jan. 31, 2025

In December 2022, the Lawrence Livermore National Laboratory's National Ignition Facility (NIF) achieved fusion ignition. Learn how Aerotech nanopositioning contributed to this...

Nanometer Scale Industrial Automation for Optical Device Manufacturing

Jan. 31, 2025

In optical device manufacturing, choosing automation technologies at the R&D level that are also suitable for production environments is critical to bringing new devices to market...