DUV light source from Cymer outputs 193 nm at 60 to 90 W
The XLR 700ix new argon fluoride deep-UV immersion light source has 193 nm output at 60 to 90 W for 14 nm lithography. It has bandwidth control of 300 ± 5 fm to reduce process variation. It has pulse energy of 10–15 mJ with a repetition rate of 6 kHz.
Cymer
San Diego, CA
www.cymer.com
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