EKSPLA to showcase femtosecond laser system at SPIE BiOS and Photonics West 2016

The UltraFlux high-energy femtosecond laser system combines an ultrafast fiber laser and solid-state and parametric amplification technologies in a <1 m² footprint box. The system generates 30 fs pulses, which can be automatically tuned in the 680–960 nm wavelength range. The company's OPCPA technology enables up to 0.35 mJ output pulse energy with >1% pulse-to-pulse stability at a 1 kHz repetition rate. Applications include femtosecond and nonlinear spectroscopy, as well as high-harmonic-generation experiments.SPIE BiOS/Photonics West booth numbers: 8424 (BiOS) and 1533 (Photonics West)To Learn More:Contact:EKSPLAHeadquarters: Vilnius, LithuaniaProduct: UltraFlux high-energy femtosecond laser systemKey Features: Up to 0.35 mJ output pulse energy with >1% pulse-to-pulse stability at a 1 kHz repetition rateWhat EKSPLA says: View more information on the UltraFlux high-energy femtosecond laser system.View More Products Locate a vendor or system integrator in our Buyer's Guide.Share new products that you think are particularly interesting or helpful by contacting Lee Dubay, Associate Editor, Laser Focus World.