Cambridge, UK, April 8, 2003. Moritex Europe has introduced a new generation of Mega Pixel Lenses that provide state-of-the-art high contrast image recognition. The new products were developed to provide the required accuracy required to inspect components and patterns that are becoming smaller and smaller.
Traditionally micro-machine lenses for alignment applications were designed prioritizing operational functions such as small size, long working distance, and depth of field. By contrast, Mega Pixel Lenses were designed to provide the highest quality resolution for precision inspection and imaging applications.
The numerical aperture of Mega Pixel Lenses is very large and aberration minimal. Optimum performance is found when used with 1.3 Mpixel CCD's. The proprietary design of Mega Pixel Lenses delivers a 200% improvement in brightness over traditional micro machine lenses meaning that excellent image contrast is achievable even under poor conditions such as when using a high-speed shutter. Since depth-of-field is very small, the lenses are hardly influenced by conditions other than the object to be inspected. Consequently Mega Pixel Lenses are perfect for surface observation applications.
All lenses have a uniform coaxial illumination system that is optimized for high reflectance objects such as semiconductor wafers and glass substrates. Mega Pixel Lenses are available in a choice of 5 standard fixed magnification
telecentric designs.
For more information, visit www.moritex.com .
Laser Focus World