Optics

Optical glass for microchips withstands EUV lithography

Jan. 12, 2025

EXTREME ULE (ultra-low expansion) titania-silicate glass material features near-zero expansion characteristics.

EXTREME ULE (ultra-low expansion) titania-silicate glass material features near-zero expansion characteristics. It withstands extreme ultraviolet (EUV) lithography, allowing chipmakers to improve photomasks critical for mass production of microchips for advanced artificial intelligence (AI) technologies.

Corning

Corning, NY

www.corning.com

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