Deformable-mirror technology from BMC subject of 28 presentations at SPIE astronomy conference

June 28, 2012
Cambridge, MA--Boston Micromachines Corporation (BMC), which produces MEMS-based deformable mirror (DM) products for adaptive-optics systems, announced today that Boston Micromachines' technology will be highlighted in at least 28 presentations and posters at the SPIE Astronomical Telescopes and Instrumentation conference held July 1-6, 2012 at the Amsterdam RAI Convention Center (Amsterdam, The Netherlands).

Cambridge, MA--Boston Micromachines Corporation (BMC), which produces MEMS-based deformable mirror (DM) products for adaptive-optics (AO) systems, announced today that Boston Micromachines' technology will be highlighted in at least 28 presentations and posters at the SPIE Astronomical Telescopes and Instrumentation conference held July 1-6, 2012 at the Amsterdam RAI Convention Center (Amsterdam, The Netherlands).

The 28 presentations and posters reflect projects that are using Boston Micromachines deformable mirrors in research such as high-contrast imaging, space-based imaging, and extreme AO. Conference sessions will be presented by Boston Micromachines' customers and collaborators.

"This conference brings together astronomical instrumentation experts from around the world," said Paul Bierden, president and co-founder of Boston Micromachines. "It is gratifying that our deformable mirror technology is being utilized by so many of these world-class researchers in their latest work."

Boston Micromachines has always been deeply involved in astronomical AO systems. In just two examples, the AO systems at Lick Observatory (Mt. Hamiton, CA) include devices made by Boston Micromachines, and in May of this year, the company was awarded a Phase II SBIR contract for $750,000 to support NASA's Exoplanet Exploration program.




About the Author

John Wallace | Senior Technical Editor (1998-2022)

John Wallace was with Laser Focus World for nearly 25 years, retiring in late June 2022. He obtained a bachelor's degree in mechanical engineering and physics at Rutgers University and a master's in optical engineering at the University of Rochester. Before becoming an editor, John worked as an engineer at RCA, Exxon, Eastman Kodak, and GCA Corporation.

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