Suited for plasma-enhanced semiconductor deposition and etch fabrication processes, the Luxtron M-1100 FluorOptic thermometry platform operates from -200°C, the start of the cryogenic range, to “hot chuck” temperatures of 450°C with accuracy of ±0.1°C and stability of ±0.05°C. The integration of five channels supports monitoring of multiple probes from a single converter.
Advanced Energy
Denver, CO
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LFW Staff
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